Exposure Analysis Tool Phase Shift Focus Monitor
High precision within ±25nm3σ. No focus matrix is required.
The exposure analysis tool, phase shift focus monitor, has high precision within ±25nm 3σ. No focus matrix is required. Focus measurements can be made with existing overlay measurement devices. For more details, please contact us or refer to the catalog.
- 企業：リソテックジャパン
- 価格：Other
